Ultraclean Surface Processing of Silicon Wafers is popular PDF and ePub book, written by Takeshi Hattori in 2013-03-09, it is a fantastic choice for those who relish reading online the Technology & Engineering genre. Let's immerse ourselves in this engaging Technology & Engineering book by exploring the summary and details provided below. Remember, Ultraclean Surface Processing of Silicon Wafers can be Read Online from any device for your convenience.
Ultraclean Surface Processing of Silicon Wafers Book PDF Summary
A totally new concept for clean surface processing of Si wafers is introduced in this book. Some fifty distinguished researchers and engineers from the leading Japanese semiconductor companies, such as NEC, Hitachi, Toshiba, Sony and Panasonic as well as from several universities reveal to us for the first time the secrets of these highly productive institutions. They describe the techniques and equipment necessary for the preparation of clean high-quality semiconductor surfaces as a first step in high-yield/high-quality device production. This book thus opens the door to the manufacturing of reliable nanoscale devices and will be extremely useful for every engineer, physicist and technician involved in the production of silicon semiconductor devices.
Detail Book of Ultraclean Surface Processing of Silicon Wafers PDF
- Author : Takeshi Hattori
- Release : 09 March 2013
- Publisher : Springer Science & Business Media
- ISBN : 9783662035351
- Genre : Technology & Engineering
- Total Page : 634 pages
- Language : English
- PDF File Size : 20,5 Mb
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