Ultra Clean Processing of Semiconductor Surfaces XI is popular PDF and ePub book, written by Paul Mertens in 2012-12-27, it is a fantastic choice for those who relish reading online the Technology & Engineering genre. Let's immerse ourselves in this engaging Technology & Engineering book by exploring the summary and details provided below. Remember, Ultra Clean Processing of Semiconductor Surfaces XI can be Read Online from any device for your convenience.
Ultra Clean Processing of Semiconductor Surfaces XI Book PDF Summary
Volume is indexed by Thomson Reuters CPCI-S (WoS). This volume covers various aspects of ultra-clean technology for the large-scale integration of semiconductors. These include cleaning and contamination control in both front-end-of-line (FEOL) and back-end-of-line (BEOL) processing, as well as cleaning for semiconductor photo-voltaic applications. Also covered are studies of general topics such as particle removal using acoustic enhancement, the removal of metallic contamination, pattern collapse of fine flexible and fragile features, wetting and drying, contamination control and contamination metrology. The FEOL and BEOL contributions also treat the surface chemistry of silicon and other semiconductors, cleaning related to new gate stacks, cleaning at the interconnect level, resist strip and polymer removal, cleaning and contamination control for various new materials and cleaning following CMP (chemical mechanical polishing).
Detail Book of Ultra Clean Processing of Semiconductor Surfaces XI PDF
- Author : Paul Mertens
- Release : 27 December 2012
- Publisher : Trans Tech Publications Ltd
- ISBN : 9783038139089
- Genre : Technology & Engineering
- Total Page : 350 pages
- Language : English
- PDF File Size : 14,6 Mb
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