Ion Implantation and Synthesis of Materials is popular PDF and ePub book, written by Michael Nastasi in 2007-05-16, it is a fantastic choice for those who relish reading online the Science genre. Let's immerse ourselves in this engaging Science book by exploring the summary and details provided below. Remember, Ion Implantation and Synthesis of Materials can be Read Online from any device for your convenience.
Ion Implantation and Synthesis of Materials Book PDF Summary
Ion implantation is one of the key processing steps in silicon integrated circuit technology. Some integrated circuits require up to 17 implantation steps and circuits are seldom processed with less than 10 implantation steps. Controlled doping at controlled depths is an essential feature of implantation. Ion beam processing can also be used to improve corrosion resistance, to harden surfaces, to reduce wear and, in general, to improve materials properties. This book presents the physics and materials science of ion implantation and ion beam modification of materials. It covers ion-solid interactions used to predict ion ranges, ion straggling and lattice disorder. Also treated are shallow-junction formation and slicing silicon with hydrogen ion beams. Topics important for materials modification, such as ion-beam mixing, stresses, and sputtering, are also described.
Detail Book of Ion Implantation and Synthesis of Materials PDF
- Author : Michael Nastasi
- Release : 16 May 2007
- Publisher : Springer Science & Business Media
- ISBN : 9783540452980
- Genre : Science
- Total Page : 271 pages
- Language : English
- PDF File Size : 10,9 Mb
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