Gate Dielectrics and MOS ULSIs is popular PDF and ePub book, written by Takashi Hori in 2012-12-06, it is a fantastic choice for those who relish reading online the Science genre. Let's immerse ourselves in this engaging Science book by exploring the summary and details provided below. Remember, Gate Dielectrics and MOS ULSIs can be Read Online from any device for your convenience.

Gate Dielectrics and MOS ULSIs Book PDF Summary

Gate Dielectrics and MOS ULSIs provides necessary and sufficient information for those who wish to know well and go beyond the conventional SiO2 gate dielectric. The topics particularly focus on dielectric films satisfying the superior quality needed for gate dielectrics even in large-scale integration. And since the quality requirements are rather different between device applications, they are selected in an applicatipn-oriented manner, e.g., conventional SiO2 used in CMOS logic circuits, nitrided oxides, which recently became indispensable for flash memories, and composite ONO and ferroelectric films for passive capacitors used in DRAM applications. The book also covers issues common to all gate dielectrics, such as MOSFET physics, evaluation, scaling, and device application/integration for successful development. The information is as up to date as possible, especially for nanometer-range ultrathin gate-dielectric films indispensible in submicrometer ULSIs. The text together with abundant illustrations will take even the inexperienced reader up to the present high state of the art. It is the first book presenting nitrided gate oxides in detail.

Detail Book of Gate Dielectrics and MOS ULSIs PDF

Gate Dielectrics and MOS ULSIs
  • Author : Takashi Hori
  • Release : 06 December 2012
  • Publisher : Springer Science & Business Media
  • ISBN : 9783642608568
  • Genre : Science
  • Total Page : 362 pages
  • Language : English
  • PDF File Size : 7,7 Mb

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